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CeF3

CeF₃ (cerium fluoride) is an important rare-earth fluoride functional material widely used in optics, catalysis, nuclear industry, and other fields. Thanks to its excellent optical transparency and stability, it has become a key raw material for optical components in the ultraviolet to mid-infrared wavelength range.

Technical Specifications
Custom specifications available upon request
The CeF₃ (cerium fluoride) crystals offered by our company are optical crystals with outstanding comprehensive performance. With their unique broad transmission range (especially covering deep ultraviolet to infrared), extremely fast scintillation decay time, and excellent radiation resistance, they have become indispensable core materials in high-end physics experiments, nuclear medical imaging, and deep ultraviolet lithography.Through advanced crystal growth and post-processing technologies, we ensure that the crystals possess high optical uniformity and low absorption characteristics, meeting the most demanding application requirements.

Basic Properties

Physical Property
Value
Remarks
Crystal Structure
Hexagonal system
/
Density
6.16 g/cm³
/
Mohs Hardness
4–5 Mohs
/
Melting Point
1460 °C
/
Transmission Range
0.3–5.0 μm
One of the core advantages: covers a broad band from deep UV to mid‑IR
Refractive Index
1.62
/
Thermal Expansion Coefficient
α∥ ≈ 16.5 × 10⁻⁶ /K, α⊥ ≈10.5 × 10⁻⁶ /K
20 °C–400 °C
Thermal Conductivity
3.5 W/m·K
At room temperature
Scintillation Performance
Emission peaks ~310 nm / ~340 nm
/
Decay Time
10–30 ns
Second core advantage: extremely fast decay time, suitable for high count‑rate applications
Light Yield
5,000 photons/MeV
/
Radiation Resistance
High
Third core advantage: minimal performance degradation and long lifetime in high‑radiation environments
Hygroscopicity
Slight
Should be stored and handled in a dry environment
Relative Dielectric Constant (1 kHz)
ε ≈ 8–10
/

CeF₃ Crystal Specifications

Specification Item
Parameter Details
Material
CeF₃
Standard Orientation
c-axis / a-axis
Optical Uniformity
Δn ≤ 2 × 10⁻⁵ @ 632.8 nm
Wavefront Distortion
< λ/8 @ 632.8 nm
Crystal Size
Diameter: 1"–3"; Thickness: 0.5 mm – 50 mm (custom sizes available upon request)
Dimensional Tolerance
±0.1 mm (custom tolerances available upon request)
Parallelism
< 20″
Perpendicularity
≤ 10′
Flatness
λ/8 @ 633 nm
Surface Finish
10–5 (MIL-PRF-13830B)
Beveled Edge
< 0.2 mm × 45°
Bulk Absorption Coefficient (@355 nm)
< 0.01 /cm
Coating
Available with deep UV (e.g., 193 nm), visible, or infrared anti-reflection coatings; custom coatings accepted
Shelf Life
12 months (must be stored sealed in a dry (<40% RH), dust-free, room-temperature environment)

Application Fields

1. High-Energy Physics & Nuclear Physics Experiments
Electromagnetic Calorimeters for Particle Detectors: As a scintillator, CeF₃’s extremely fast decay time and high radiation hardness make it essential for particle detection in high-luminosity colliders (such as LHC, CEPC, etc.). It enables precise measurement of energy and timing for electrons and photons.
2. Nuclear Medical Imaging
PET/MRI-Compatible Detectors: Its fast timing characteristics help improve the time resolution of positron emission tomography (PET). Moreover, being non-hygroscopic and MR-compatible, it offers a solution for next-generation high-performance PET detectors.
3. Semiconductor Manufacturing
Deep Ultraviolet Lithography Optical Components: Benefiting from its excellent transmission at deep UV wavelengths such as 193 nm and strong laser damage resistance, CeF₃ can be used to fabricate lenses, prisms, and other optical elements for lithography machines.
4. Scientific Research & Specialized Equipment
 
High-Speed Scintillation Detection and Imaging: Applied in scientific instruments requiring high time resolution, such as time-of-flight measurements and nuclear spectrometers.
UV/Deep-UV Laser System Windows/Prisms: Utilizing its broad UV transmission range, it serves as an ideal material for laser cavity mirrors, windows, and dispersive elements.
 
5. Radiation Detection & Safety
Nuclear Radiation Monitoring & Environmental Monitoring: Used to manufacture radiation detectors and monitoring devices capable of stable operation in high-radiation environments.
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