Yb:KGW

Yb³⁺:KY(WO₄)₂ (Yb:KYW) is a high‑performance laser crystal material. It features a broad absorption bandwidth, high quantum efficiency, and excellent thermo‑mechanical properties, enabling highly efficient laser output. It is particularly well suited for diode‑pumped high‑power and ultrafast laser systems. Its simple energy level structure minimizes upconversion losses and nonradiative relaxation, giving it unique advantages in high‑power laser applications.

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Technical Specifications

Custom specifications available upon request

Product Features

Yb:KYW delivers wide absorption bandwidth, high quantum efficiency, and superior thermo‑mechanical performance, allowing for high‑efficiency laser generation. It is ideally matched to diode‑pumped high‑power and ultrafast laser architectures. The simplicity of its energy levels reduces upconversion losses and nonradiative decay pathways, resulting in distinctive performance benefits in high‑power regimes.

Basic Characteristics

Property	Value	Remarks
Chemical Formula	Yb³⁺:KY(WO₄)₂, Yb:KYW	/
Crystal Structure	Monoclinic	/
Lattice Parameters	a = 10.65 Å, b = 10.41 Å, c = 7.53 Å, β = 130.7°	/
Refractive Index	n₉ ≈ 2.02, nₚ ≈ 1.98, nₘ ≈2.01	Test wavelength 1020–1050 nm, customization supported
Mohs Hardness	4–5	/
Thermal Conductivity	Kₐ ≈ 2.9 W/m·K Kᵦ ≈ 4.0 W/m·K Kc𝒸 ≈ 3.6 W/m·K	Room temperature
Melting Point	1085 °C	/
Density	7.18 g/cm³	/
Thermal Expansion Coefficient	αₐ ≈ 4.1×10⁻⁶/°C αᵦ ≈ 3.7×10⁻⁶/°Cαᵦ ≈3.7×10⁻⁶/°C αc𝒸 ≈ 8.6×10⁻⁶/°C	Room temperature
Absorption Bandwidth	981 nm (FWHM 4–5 nm)	Main absorption peak

Yb:KGW Crystal Specification Parameters

Item	Specification
Doping Concentration	0.2% – 10 at.% (note: range corrected for clarity)
Maximum Length	45 mm
Dimensional Tolerance	Diameter tolerance: ±0.05 mm, Length tolerance: ±0.1 mm, customization supported
Surface Finish	20/10 (per MIL‑PRF‑13830B standard)
Flatness	≤λ/8 @ 633 nm
Parallelism	20″
Perpendicularity	≤15′
Chamfer	≤0.2 mm × 45°
Edge Chipping	≤0.1 mm
Coating	Custom coating design service available
Quality Guarantee Period	1 year (under normal use)

Application Fields

High‑Power Lasers

1.0–1.1 µm Laser Output: Suitable for high‑power continuous‑wave and pulsed lasers used in industrial processing, scientific research, and related fields.

Thin‑Disk Lasers: Functions as the gain medium in high‑power thin‑disk laser systems, playing an important role in achieving high beam quality and power scalability.

Ultrafast Laser Systems

Femtosecond Lasers: Utilizes its broad emission bandwidth to generate femtosecond‑scale ultrashort pulses.

Mode‑Locked Lasers: Applied in high‑repetition‑rate ultrafast laser systems for scientific research and industrial uses.

Medical and Bio‑Imaging

Laser Surgical Equipment: Used in precision surgical procedures and dermatological treatments.

Multiphoton Microscopy: Serves as the excitation source for deep‑tissue imaging with high resolution.

Industrial and Micromachining

Precision Marking and Cutting: Suitable for high‑accuracy processing of metals, ceramics, polymers, and other materials.

Solar Cell Fabrication: Applied in edge isolation and thin‑film cutting of silicon‑based solar cells.

Yb:KGW

Product Features​

Basic Characteristics

Yb:KGW Crystal Specification Parameters

Application Fields​

High‑Power Lasers​

Ultrafast Laser Systems​